L3 Neo, the next generation of the market-proven Level and Pressure Transmitter L3, sets new standards in Level and Pressure Control. With its exceptional performance characteristics, the L3 is particularly suitable for process pressure control in critical environments, or for superior level and volume measurement. This applies specifically for smaller vessels or for high and changing process temperatures for which pressure sensors were previously not considered precise enough.
Process Connection | Tri-Clamp | CLEANadapt | Anderson Flush Mount | DRD | CPM | Endress & Hauser Universal |
Wetted material | Stainless steel, AISI 304 (1.4301), Ra ≤ 0.8 μm (32 μin) |
Wetted material 2 | FOOD: Stainless steel, AISI 316L, Ra ≤ 0.64 μm (25 μin) PHARMA: Stainless steel, AISI 316L, Ra ≤ 0.2 μm (8 μin) |
Measuring range | -1…35 bar Relative |
Accuracy | ≤ 0.10% of the calibrated range |
Available versions | Compact | Remote |
Temperature range process | -18...110°C (0...230°F) |
Temperature range CIP/SIP | 135°C (275°F) | max. 60 min. |
Communication | 4…20 mA | IO-Link | HART |
Technical Support: How to videos | Click here to view the playlist of our How to videos |
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